We are seeking R&D-oriented Engineers to join our team in the development and improvement of semiconductor manufacturing equipment, specifically focusing on plasma-based chambers.

Key Responsibilities:

· Conduct research and development of components and mechanisms, including concept creation, feasibility studies, and practical evaluation/testing.

· Perform hardware characterization, define process window, and analyze process-hardware interaction.

· Design experiments, collect data, analyze results, and compile reports on various process development experiments

· Develop new equipment and functionalities, as well as improve existing equipment, from specification to detailed design.

· Ability to function in multi-disciplined fields (Process development, Hardware development and Metrology)

Required Skills:

· PhD in Physics, Engineering (Chemical, Electrical, Mechanical, or related fields), Material Science or Master degree with at least 3 years professional experience.

· In-depth knowledge of low-pressure RF plasma systems, including ICP, CCP, and microwave plasma sources

· Strong understanding of plasma-surface interactions, and precursor/plasma chemistry. Familiarity with PECVD, PEALD, RIE process mechanisms.

· Excellent communication skills for technical documentation, cross-functional collaboration, and customer-facing discussions

Preferred Skills:

· Familiarity with epitaxial silicon growth and characterization

· Familiarity with EM and multi-physics simulation tools (e.g., COMSOL, High Frequency Simulation software such as Ansys HFSS, CST studio )

· Familiarity with plasma diagnostics (e.g., Langmuir probes, OES, VI probes)

· Familiarity with common thin-film & chemical characterization & metrology techniques including: SEM, TEM, XRD, Ellipsometry, XPS / AES as well as ICP-MS, particle analysis, sheet resistance probe analysis etc