The intern will review PEALD SiN gap-fill process and figure out the mechanism of specific recipe. In parallel, they will review process results and analyze effective deposition parameters for performance improvement. Finally, they will summarize their findings to build the mechanism with physical/chemical model and experimental data.

What you will be working on

The intern will go through process responses by the single parameter skew. Deposition recipe consists of a lot of parameters. Referring to the typical recipe, it will be to start with suspected effective parameters. Then, they will analyze the process sensitivity in each parameter to figure out what parameter is effective and how effective process improvement is, especially on gap-fill capability (GPC profile) and throughput. There should be some trade-off relationships. The analysis can clarify the effective parameter(s) to have good gap-fill capability and throughput. They will propose what recipe should be good to achieve the target or to maximize throughput, if they have simulation capability, they can collaborate with the team and validate the model of the mechanism by the simulation. The final goal is to show the direction of gapfill performance improvement based on experimental data and theoretical models.

What we are looking for

For this project, an intern with Materials Engineering, Applied Chemistry, Chemical Engineering and Electronic Engineering or other types of Engineering (Plasma related is preferred) would be ideal. Considering the scope of this project, doctoral degree level is preferred, although a master’s degree level with specific experience would also be acceptable.