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This project focuses on systematic development and optimization of CVD process recipe and settings to improve film properties (thickness, uniformity and stress) while maximizing throughput and minimizing waste.
The selected intern will work closely with engineering team to analyze current process limitations, design targeted experiments, and refine parameters to establish a robust, repeatable deposition recipe.

Desired Skills Required:

• Familiarity with thin-film deposition concepts, vacuum systems or semiconductor manufacturing processes
• Strong analytical mindset with exposure to statistical data analysis or DoE software (eg. JMP)
• Detail oriented with a strong commitment to laboratory safety protocols

Additional Information

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Applied Materials is an Equal Opportunity Employer. Qualified applicants will receive consideration for employment without regard to race, color, national origin, citizenship, ancestry, religion, creed, sex, sexual orientation, gender identity, age, disability, veteran or military status, or any other basis prohibited by law.